Paper Secondary electron emission from magnetron targets, published in IOP PSST 2023. DOI 10.1088/1361-6595/acd57e
| Field | Value |
|---|---|
| Publisher | |
| Authors | |
| Release Date | 2023-05-25 |
| Identifier | 270f621f-6067-4e19-bb21-2c63605b4829 |
| Permanent Identifier (URI) | |
| Is supplementing | |
| Plasma Source Name | |
| Plasma Source Application | |
| Plasma Source Specification | |
| Plasma Source Properties | Colutron source: ICP discharge generates an argon plasma. biased electrodes enable the extraction of ions. A beam of ion is formed with one mass-to-charge-ratio using biased electrodes and a Wien Filter. |
| Language | English (United States) |
| License | |
| Plasma Medium Name | |
| Plasma Target Name | |
| Contact Name | Rahel Buschhaus |
| Plasma Target Properties | Aluminum (25 µm, purity of 99.999 %), titanium (127 µm, purity of 99.99 %), and copper (254 µm, purity of 99.9 %) targets with a size of 2.8 cm ×2.8 cm.
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| Plasma Target Procedure | Procedure explained in Paper R Buschhaus et al. Plasma Sources Sci. Technol. 31 (2022) 025017.
(1) Clean targets: 1. Surface cleaning by Ar+ sputtering from ECR ion beam source. 2. SEEC & EEDF measurements with either ECR or Colutron source.
(2) untreated/air-exposed targets: 1. targets inserted into experimental chamber without prior surface cleaning by sputtering. 2. 2. SEEC & EEDF measurements with either ECR or Colutron source.
(3) in-situ oxidized targets: 1. Surface cleaning by Ar+ sputtering from ECR ion beam source. 2. oxidation of surface by O/O2 beam from OBS source. 3. 2. SEEC & EEDF measurements with either ECR or Colutron source plus simulataniously flow of O/O2. |
| Contact Email | |
| Plasma Diagnostic Properties | Cylindrical shaped electrodes surrounding the target to measure ion and electron currents. Described in Carles Corbella et al 2016 J. Phys. D: Appl. Phys. 49 16LT01 |
| Public Access Level | Public |
| Plasma Diagnostic Name | |
| Funding Agency | |
| Project | |
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Data and Resources
Project Contact Name:
Achim von Keudell

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