![[Open Data]](https://assets.okfn.org/images/ok_buttons/od_80x15_blue.png)
A new computationally assisted diagnostic to measure NO densities in atmospheric-pressure microplasmas by Optical Emission Spectroscopy (OES) is developed and validated against absorption spectroscopy in a volume Dielectric Barrier Discharge (DBD). The OES method is then applied to a twin surface DBD operated in N2 to measure the NO density as a function of the O2 admixture (0:1%–1%). The underlying rate equation model reveals that NO(A2Σ+) is primarily excited by reactions of the ground state NO(X2Π) with metastables N2(A3Σ+u).
| Field | Value |
|---|---|
| Publisher | |
| Authors | |
| Release Date | 2021-02-03 |
| Identifier | 6df02003-bed9-4395-a3c6-26bc028828da |
| Permanent Identifier (URI) | |
| Is supplementing | |
| Plasma Source Name | |
| Plasma Source Application | |
| Plasma Source Specification | |
| Plasma Source Properties | Both plasma sources are driven by damped sine wave pulses with a microsecond rise time. The pulse repetition frequency is chosen as f = 1000 Hz, and the
voltage amplitude can be varied from 0 to 20 kVpp. Each high voltage (HV) pulse has a sequential profile with damped oscillations and a frequency of ~650 kHz. |
| Language | English (United States) |
| Plasma Source Procedure | The different nitrogen/oxygen gas mixtures are chosen as follows: 99.9%/0.1%, 99.5%/0.5%, and 99%/1%. The total gas flow amounts to 10 slm in case of the SDBD setup and to 2 slm for the VDBD setup. |
| License | |
| Plasma Medium Name | |
| Plasma Medium Properties | The different nitrogen/oxygen gas mixtures are chosen as follows: 99.9%/0.1%, 99.5%/0.5%, and 99%/1%. The total gas flow amounts to 10 slm in case of the SDBD setup and to 2 slm for the VDBD setup. |
| Plasma Medium Procedure | Before gas mixtures were changed, the vessel was completely evacuated, to minimise impurities. |
| Plasma Target Name | |
| Contact Name | F. Kogelheide |
| Contact Email | |
| Plasma Diagnostic Properties | Capacitive voltage divider (P6015A; Tektronix)
Current monitor (Model 2877; Pearson Electronics)
Digital oscilloscope (LeCroy9459 DUAL 350 MHz; LeCroy)
Echelle spectrometer (ESA 4000; LLA Instruments, Germany)
Intensified charge‐coupled camera (ICCD, 4 Picos; Stanford Computer Optics)
Deuterium lamp (X2D2, Hamamatsu, Japan)
Spectrometer (QE65000, OceanOptics, USA) |
| Public Access Level | Public |
| Plasma Diagnostic Name | |
| Funding Agency | |
| Project |
Data and Resources
Project Contact Name:
P. Awakowicz