Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching Project: Individual ResearchAuthors: J. GiesekusA. PletzerF. BeckfeldK. NoesgesC. BockJ. SchulzePlasma for Materials / Surfaces zip
Nonlocal dynamics of secondary electrons in capacitively coupled radio frequency discharges Authors: K. NoesgesM. KlichB. HorvathJ. SchulzeR. P. BrinkmannT. MussenbrockS. WilczekA. DerzsiPlasma Modeling and Simulation 55x txt 3x zip
