Etching profile of a:C-H with a magnetic field of 80 mT
EP2
- Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching
A spatially two dimensional fluid-MC hybrid (fluid-kinetic) simulation method is developed and applied to the COST reference microplasma jet operated in helium with an oxygen admixture of 0.5\%, excited by a single frequency voltage waveform with...