SEM electrolyte KOH
EP2
- Nanosecond and microsecond-pulsed plasma-in-liquid treated copper oxide surfaces
Datasets
1133 results
CV us PAW treated copper
EP2
- Nanosecond and microsecond-pulsed plasma-in-liquid treated copper oxide surfaces
current measurement microsecond plasma
EP2
- Nanosecond and microsecond-pulsed plasma-in-liquid treated copper oxide surfaces
voltage measurement nanosecond plasma
EP2
- Nanosecond and microsecond-pulsed plasma-in-liquid treated copper oxide surfaces
Electronegativity effects on plasma dynamics in He/O2 RF microplasma jets at atmospheric
AEPT
This work investigates the transitions between ohmic mode and Penning-Gamma mode in a capacitively coupled radio frequency micro atmospheric pressure plasma jets operated in He/O2 mixtures by comparing phase-resolved optical emission spectroscopy...
Electronegativity effects on plasma dynamics in He/O2 RF microplasma jets at atmospheric pressure
AEPT
- Electronegativity effects on plasma dynamics in He/O2 RF microplasma jets at atmospheric
Electron and gas temperature-driven chemistry during microdischarges formed in water vapor bubbles
AEPT
- Electron and gas temperature-driven chemistry during microdischarges formed in water vapor bubbles
Electron and gas temperature-driven chemistry during microdischarges formed in water vapor bubbles
AEPT
Microdischarges formed in bubbles immersed in liquids are of interest for materials synthesis and chemical conversion applications in the frame of plasma-driven electrochemistry. A key challenge associated with controlling such processes is the...
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
AEPT
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In this work, a low frequency (100 kHz) tailored pulse-wave-shaped bias...
Full datasets for all figures from the publication
AEPT
- Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching