Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching Project: Individual ResearchAuthors: J. GiesekusA. PletzerF. BeckfeldK. NoesgesC. BockJ. SchulzePlasma for Materials / Surfaces zip
Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching Authors: Elia JünglingThomas MussenbrockMarc BökeAchim von KeudellSebastian WilcekPlasma Science Fundamentals 4x txt
