Primary tabs

Inorganic Materials Chemistry

Our group focuses on the development, synthesis and evaluation of high-performance precursors for vapor phase deposition processes namely chemical vapor deposition (CVD), atomic layer deposition (ALD) and molecular layer deposition (MLD).

License

Creative Commons Attribution 4.0 International
[Open Data]

Other Access

The information on this page (the dataset metadata) is also available in these formats.

JSON RDF

via the DKAN API

Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development

Plasma for Materials / Surfaces
PEALD
Al2O3
Thin film
FieldValue
Publisher
Inorganic Materials Chemistry
Authors
L. Mai
M. Gebhard
T. de los Arcos
I. Giner
F. Mitschker
M. Winter
H. Parala
P. Awakowicz
G. Grundmeier
A. Devi
Release Date
2020-04-24
Identifier
91cb199c-7742-4011-a4e5-c8e406ceb9bb
Permanent Identifier (DOI)
https://doi.org/10.1002/chem.201702939
Permanent Identifier (URI)
https://rdpcidat.rub.de/node/109
Is supplementing
https://doi.org/10.1002/chem.201702939
Plasma Source Name
ECWR
Plasma Source Application
coatings
Plasma Source Specification
low pressure
Language
English
License
Creative Commons Attribution 4.0 International
Contact Name
Anjana Devi
Contact Email
anjana.devi@rub.de
Public Access Level
Public
Funding Agency
German Science Foundation (DFG)
Project
SFB TR 87
Subproject
B4