PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases Project: SFB TR 87Authors: D. ZandersE. CiftyurekE. SubasiN. HusterC. BockA. KostkaD. RogallaK. SchierbaumA. DeviPlasma for Materials / Surfaces html
