Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development Project: SFB TR 87Authors: L. MaiM. GebhardT. de los ArcosI. GinerF. MitschkerM. WinterH. ParalaP. AwakowiczG. GrundmeierA. DeviPlasma for Materials / Surfaces html
An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor Project: SFB TR 87Authors: M. GebhardF. MitschkerM. WiesingI. GinerB. TorunT. de los ArcosP. AwakowiczG. GrundmeierA. DeviPlasma for Materials / Surfaces html
