fig13c_electrons_VE_rate_var
BPT
- Vibrational kinetics in repetitively pulsed atmospheric pressure nitrogen discharges: average-power-dependent switching behaviour
Datasets
1120 results
fig14a_E_power_var_rxn_rate_var
BPT
- Vibrational kinetics in repetitively pulsed atmospheric pressure nitrogen discharges: average-power-dependent switching behaviour
fig14b_N2AP1S_power_var_rxn_rate_var
BPT
- Vibrational kinetics in repetitively pulsed atmospheric pressure nitrogen discharges: average-power-dependent switching behaviour
fig14c_N2A_power_var_rxn_rate_var
BPT
- Vibrational kinetics in repetitively pulsed atmospheric pressure nitrogen discharges: average-power-dependent switching behaviour
fig14d_N_power_var_rxn_rate_var
BPT
- Vibrational kinetics in repetitively pulsed atmospheric pressure nitrogen discharges: average-power-dependent switching behaviour
Nanosecond plasmas in water: ignition, cavitation and plasma parameters
EP2
Nanosecond plasmas in liquids play an important role in the field of decontamination, electrolysis or plasma medicine. The understanding of these very dynamic plasmas requires information about the temporal variation of species densities and...
Nanosecond pulsed discharges in distilled water - Part II: Line emission and plasma propagation
EP2
Nanosecond plasmas in liquids can initiate chemical processes that are exploited in the elds of water treatment, electrolysis or biomedical applications. The understanding of these chemical processes relies on unraveling the dynamics of the...
- 2x csv
State enhanced actinometry in the COST microplasma jet
PIP
A new actinometry approach, state enhanced actinometry (SEA), is presented. This diagnostic uses the emission of the atomic states O(3p3P (λ=844.6 nm), Ar(2p1) (λ=750.4 nm) and He(33S) (λ=706.5 nm) and allows the atomic oxygen density and the...
- 6x txt
Effects of a radial variation of surface coefficients on plasma uniformity in capacitive RF discharges
AEPT
With the increasing demands towards large area plasma etching and deposition, the radial uniformity of capacitively coupled plasmas (CCPs) becomes one of the key factors that determine process performance in industrial applications. However,...
- 4x zip