Figure 5b emission intensity vs. voltage neg. pol.
EP2
- Ignition and propagation of nanosecond pulsed plasmas in distilled water - negative vs. positive polarity applied to a pin electrode
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Figure 5a emission intensity vs. voltage pos. pol.
EP2
- Ignition and propagation of nanosecond pulsed plasmas in distilled water - negative vs. positive polarity applied to a pin electrode
Figure 3 BCS voltage data for both polarities
EP2
- Ignition and propagation of nanosecond pulsed plasmas in distilled water - negative vs. positive polarity applied to a pin electrode
Figure 2b Emission spectra modelling neg. pol.
EP2
- Ignition and propagation of nanosecond pulsed plasmas in distilled water - negative vs. positive polarity applied to a pin electrode
Figure 2a Emission spectra modelling pos. pol.
EP2
- Ignition and propagation of nanosecond pulsed plasmas in distilled water - negative vs. positive polarity applied to a pin electrode
Ignition and propagation of nanosecond pulsed plasmas in distilled water - negative vs. positive polarity applied to a pin electrode
EP2
Nanosecond plasmas in liquids are being used for water treatment, electrolysis or biomedical applications. The exact nature of these very dynamic plasmas and most important their ignition physics are strongly debated. The ignition itself may be...
Propagation of nanosecond plasmas in liquids—Streamer velocities and streamer lengths
EP2
Nanosecond plasmas in liquids are often generated by applying a short high voltage pulse to an electrode immersed in a liquid for biomedical or environmental applications. The plasmas appear as streamers that propagate through the liquid. The...
Figure1_voltage
EP2
- Propagation of nanosecond plasmas in liquids—Streamer velocities and streamer lengths
Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching
EP2
Three-dimensional (3D) etching of materials by plasmas is an ultimate challenge in microstructuring applications. A method is proposed to reach a controllable 3D structure by using masks in front of the surface in a plasma etch reactor in...
- 4x txt
Etching profile of a:C-H with a magnetic field of 0 mT
EP2
- Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching