low pressure
Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development
Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
Fast charge exchange ions in high power impulse magnetron sputtering of titanium as probes for the electrical potential
High Power Impulse Magnetron Sputtering
Submitted by kd on Wed, 01/08/2020 - 00:09