Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices Project: SFB TR 87Authors: D. ZandersL. MaiE. SubasiE. CiftyurekC. HoppeD. RogallaW. GilbertT. de los ArcosK. SchierbaumG. GrundmeierC. BockA. DeviPlasma for Materials / Surfaces html
