Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices Project: SFB TR 87Authors: D. ZandersL. MaiE. SubasiE. CiftyurekC. HoppeD. RogallaW. GilbertT. de los ArcosK. SchierbaumG. GrundmeierC. BockA. DeviPlasma for Materials / Surfaces html
PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases Project: SFB TR 87Authors: D. ZandersE. CiftyurekE. SubasiN. HusterC. BockA. KostkaD. RogallaK. SchierbaumA. DeviPlasma for Materials / Surfaces html
