D. Zanders | Research Data Repository

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

Project:

SFB TR 87

Authors:

D. Zanders

L. Mai

E. Subasi

E. Ciftyurek

C. Hoppe

D. Rogalla

W. Gilbert

T. de los Arcos

K. Schierbaum

G. Grundmeier

C. Bock

A. Devi

Plasma for Materials / Surfaces

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Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide

Project:

SFB TR 87

Authors:

L. Mai

N. Boysen

D. Zanders

T. de los Arcos

F. Mitschker

B. Mallick

G. Grundmeier

P. Awakowicz

A. Devi

Plasma for Materials / Surfaces

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PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases

Project:

SFB TR 87

Authors:

D. Zanders

E. Ciftyurek

E. Subasi

N. Huster

C. Bock

A. Kostka

D. Rogalla

K. Schierbaum

A. Devi

Plasma for Materials / Surfaces

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