D. Rogalla
PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor
Project:
SFB TR 87