{"help":"Return the metadata of a dataset (package) and its resources. :param id: the id or name of the dataset :type id: string","success":true,"result":[{"id":"892ceccd-2c8c-4e53-9c84-0917f9696338","name":"metastable-argon-atom-kinetics-low-pressure-capacitively-coupled-radio-frequency-discharge","title":"Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge","maintainer":"Research Data Repository","maintainer_email":"achim.vonkeudell@rub.de","license_title":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/","notes":"\u003Cp\u003EThe kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell\/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a large number of excited states of Ar atoms. The spatial density distribution of Ar atoms in the 1s5 state within the electrode gap and the gas temperature are also determined experimentally using tunable diode laser absorption spectroscopy. Processes involving the excited states, especially the four lower-lying 1s states are found to have significant effects on the ionization balance of the discharge. The level of agreement achieved between the computational and experimental results indicates that the discharge model is reasonably accurate and the computations based on this model allow the identification of the populating and de-populating processes of the excited states.\u003C\/p\u003E\n","url":"https:\/\/rdpcidat.rub.de\/dataset\/metastable-argon-atom-kinetics-low-pressure-capacitively-coupled-radio-frequency-discharge","state":"Active","log_message":"Edited by kd.","private":true,"revision_timestamp":"Sun, 05\/28\/2023 - 07:04","metadata_created":"Tue, 05\/23\/2023 - 16:32","metadata_modified":"Sun, 05\/28\/2023 - 07:04","creator_user_id":"ca053837-c858-4732-b18b-8788ce3dee4d","type":"Dataset","resources":[{"id":"20edbf18-1cdf-4f91-9dba-3f43a09be2cd","revision_id":"","url":"https:\/\/rdpcidat.rub.de\/sites\/default\/files\/exp_data.zip","description":"","format":"zip","state":"Active","revision_timestamp":"Sun, 05\/28\/2023 - 07:04","name":"Experimental data","mimetype":"application\/zip","size":"463.67 KB","created":"Tue, 05\/23\/2023 - 16:34","resource_group_id":"60dfa3fb-4113-4271-8531-8587fa07dcbe","last_modified":"Date changed  Sun, 05\/28\/2023 - 07:04"},{"id":"cbc69758-cf86-4aaf-b4c2-42e8d1ebf841","revision_id":"","url":"https:\/\/rdpcidat.rub.de\/sites\/default\/files\/sim_data.zip","description":"","format":"zip","state":"Active","revision_timestamp":"Sun, 05\/28\/2023 - 07:04","name":"Simulation data","mimetype":"application\/zip","size":"3.97 MB","created":"Tue, 05\/23\/2023 - 16:35","resource_group_id":"60dfa3fb-4113-4271-8531-8587fa07dcbe","last_modified":"Date changed  Sun, 05\/28\/2023 - 07:04"}],"tags":[{"id":"8c9b3af5-0afc-4156-949f-b0e53da6f1e3","vocabulary_id":"2","name":"PIC-MCC"},{"id":"db046e3c-8dff-4d25-b6e1-392c4ae5bc41","vocabulary_id":"2","name":"TDLAS"},{"id":"cb63856b-393b-4a34-8702-814847da8246","vocabulary_id":"2","name":"metastable atoms"},{"id":"f962b449-3ecd-4537-97aa-e4730daa75ba","vocabulary_id":"2","name":"CCP"}],"groups":[{"description":"\u003Cp\u003EThe group \u0022Allgemeine Elektrotechnik und Plasmatechnik\u0022 at the faculty for engineering and information science.\u003C\/p\u003E\n","id":"60dfa3fb-4113-4271-8531-8587fa07dcbe","image_display_url":"https:\/\/rdpcidat.rub.de\/sites\/default\/files\/AEPT2.png","title":"AEPT","name":"group\/aept"}]}]}