{"help":"Return the metadata of a dataset (package) and its resources. :param id: the id or name of the dataset :type id: string","success":true,"result":[{"id":"51e443af-3ba5-481a-91f2-93350dd2bbf3","name":"atomicmolecular-layer-deposition-hybrid-inorganic\u2013organic-thin-films-erbium-guanidinate","title":"Atomic\/molecular layer deposition of hybrid inorganic\u2013organic thin films from erbium guanidinate precursor","author_email":"anjana.devi@rub.de","maintainer":"Research Data Repository","maintainer_email":"achim.vonkeudell@rub.de","license_title":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/","notes":"\u003Cp\u003ELuminescent erbium-based inorganic\u2013organic hybrid materials play an important role in many frontier nano-sized applications, such as amplifiers, detectors and OLEDs. Here, we demonstrate the possibility to fabricate high-quality thin films comprising both erbium and an appropriate organic molecule as a luminescence sensitizer utilizing the combined atomic layer deposition and molecular layer deposition (ALD\/MLD) technique. We employ tris(N,N\u2032-diisopropyl-2-dimethylamido guanidinato)erbium(III) [Er(DPDMG)3] together with 3,5-pyridine dicarboxylic acid as precursors. With the appreciably high film deposition rate achieved (6.4 \u00c5 cycle\u22121), the guanidinate precursor indeed appears as an interesting new addition to the ALD\/MLD precursor variety toward novel materials. Our erbium\u2013organic thin films showed highly promising UV absorption properties and a photoluminescence at 1535 nm for a 325-nm excitation, relevant to possible future luminescence applications.\u003C\/p\u003E\n","url":"https:\/\/rdpcidat.rub.de\/dataset\/atomicmolecular-layer-deposition-hybrid-inorganic%E2%80%93organic-thin-films-erbium-guanidinate","state":"Active","log_message":"Update to resource Atomic\/molecular layer deposition of hybrid inorganic\u2013organic thin films from erbium guanidinate precursor","private":true,"revision_timestamp":"Thu, 04\/25\/2024 - 16:10","metadata_created":"Fri, 04\/24\/2020 - 11:39","metadata_modified":"Thu, 04\/25\/2024 - 16:10","creator_user_id":"a3d3820b-5155-4810-ab1b-227b1eed2c58","type":"Dataset","resources":[{"id":"9f96da70-252c-422f-8142-1f1b42698980","revision_id":"","url":"https:\/\/doi.org\/10.1007\/s10853-017-0855-6","description":"","format":"html","state":"Active","revision_timestamp":"Thu, 04\/25\/2024 - 16:10","name":"Atomic\/molecular layer deposition of hybrid inorganic\u2013organic thin films from erbium guanidinate precursor","mimetype":"html","size":"","created":"Fri, 04\/24\/2020 - 11:39","resource_group_id":"efd12b80-2fad-4ff2-8d78-c87e08b01ea8","last_modified":"Date changed  Thu, 04\/25\/2024 - 16:10"}],"tags":[{"id":"350da76b-4c22-4156-acc1-f08687cb6add","vocabulary_id":"2","name":"ALD-MLD"},{"id":"81fed940-ee4b-4cd4-926a-8e59559ffc02","vocabulary_id":"2","name":"Hybrid materials"},{"id":"b8b2ce26-98a1-4f58-83ad-4b953cbadfdc","vocabulary_id":"2","name":"Precursor chemistry"}],"groups":[{"description":"\u003Cp\u003EOur group focuses on the development, synthesis and evaluation of high-performance precursors for vapor phase deposition processes namely chemical vapor deposition (CVD), atomic layer deposition (ALD) and molecular layer deposition (MLD).\u003C\/p\u003E\n","id":"efd12b80-2fad-4ff2-8d78-c87e08b01ea8","image_display_url":"https:\/\/rdpcidat.rub.de\/sites\/default\/files\/logo_0.png","title":"Inorganic Materials Chemistry","name":"group\/inorganic-materials-chemistry"}]}]}